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Vacuum Tube Furnace for Graphene Growth in Laboratory

Min.Order Quantity: 1 Set/Sets Vacuum Tube Furnace for Graphene Growth in Laboratory

Supply Ability: 2 Set/Sets per Month Vacuum Tube Furnace for Graphene Growth in Laboratory

Payment Terms: L/C,T/T,


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Introduction of equipment
 
TF1200-PECVD plasma enhanced chemical vapor deposition (PECVD) system is a chemical reaction in which the kinetic energy of electrons in the plasma produced by glow discharge is used to deactivate the gas phase. The system consists of TF1200 series vacuum tube furnace, quartz reaction chamber, radio frequency power supply, multi-channel air mixing system, vacuum unit and reaction control system.
 
 
Equipment characteristics
 
1. Using glow discharge to generate plasma electrons to activate gas phase.
 
2. The deposition rate and film quality of gas phase reaction are improved.
 
3. Deposition rate can be controlled by adjusting the frequency of RF power supply.
 
4. It can be widely used in the growth of graphene, SiOx, SiNx, CNx and TiCxNy films.

 Open Vacuum Tube Furnace

 
 
 
Quartz tube: 60/80/100mm L1400mm
 
 
 
Heating zone size: 440mm
 
 
 
Constant Temperature Zone Size: 200mm
 
 
 
Temperature control mode: Adopting artificial intelligence regulation technology, it has the function of PID regulation and self-tuning, and can compile 30-section temperature-rising and cooling program.
 
 
 
Heating rate: < 20 min
 
 
 
Limit Temperature: <1200 C
 
 
 
Long-term working temperature: <1150 C
 
 
 
Surface temperature: < 60 (< 1000 C)
 
 
 
Temperature Control Accuracy: +1
 
 
 
Heating element: resistance wire (0Cr27Al7Mo2)
 
 
 
Sealing and Connection: CF KF Vacuum Bellows
 
 
 
Mass Mixing System: Flow Specification 50sccm 100sccm 200sccm 300sccm 500sccm (optional range)
 
 
 
Regulating Valve Type: Electromagnetic Regulating Valve
 
 
 
Control accuracy: +0.2%F.S
 
 
 
Working pressure difference range: (50-300) KPa
 
 
 
Size of mixing tank: 80 *120 mm
 
 
 
Electric power: AC220V/50HZ/20W
 
 
 
Vacuum system parameters
 
 
 
Low Vacuum Configuration: 4L/S Mechanical Pump Resistance Vacuum Gauge Vacuum Bellows Baffle Valve
 
 
 
Limit Vacuum: <0.1Pa
 
 
 
High Vacuum Configuration: 4L/S Mechanical Pump 300L/S Molecular Pump Composite Vacuum Gauge Vacuum Bellows Baffle Valve
 
 
 
Limit Vacuum: <1.3*10-4Pa
 
 
 
RF power supply system
 
 
 
Output power: 5-300W 5-500W (optional)
 
 
 
Control mode: manual/PLC/PC
 
 
 
Working frequency: 13.56MHZ standard sine wave
 
 
 
Supply Voltage: Single Phase AC (190V-240V)
 
 
 
Cooling mode: air cooling
 
 
 
Equipment dimensions: 1800mm (long) * 600mm (wide) * 1390mm (high)
 
 
 
Equipment weight: 215KG

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