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Process Chemistry of Multistage Roots Pump


In the coating process, especially in the flat screen semiconductor production and solar energy industry, as described in this chapter, the corrosion resistance of vacuum pumps is of great significance. In addition to process compatibility, small space occupation and low operating costs are particularly important pump body parameters. Compared with previous models, the P series meets these requirements by reducing power input by up to 53%, while maintaining the same occupancy space.

The pump series is based on the A 103P air operation process pump. We have adopted two models of this series, supplemented by Roots pumps, to improve pumping speed and gas throughput in the range of process pressure. Due to the six-stage design of A 103P and the energy-saving motor, the power input is kept at a low level. The six-stage design of A 103P reduces the differential voltage between the levels and also reduces the power input of the pump. Except for stage 6, large intake stage and high speed allow high pumping speed and low limit pressure.

The muffler is directly placed on the pump body to form a compact pump design, and the muffler is heated directly by the pump body without additional heating sleeve to save energy. Temperature control and continuous detection of the whole pump heating are necessary to prevent the condensation of reaction by-products.

Because of P series standby options, not only does the pump use less cooling water, but also reduces the consumption of flushing gas outside the process operation, which leads to lower operating costs.

A wide range of activation and control options allow not only manual control modes, but also control through system control and monitoring network connections. Important parameters can be directly output and derived for statistical evaluation.

Process Chemistry of Multistage Roots Pump

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