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High precision Electron Beam Evaporation Vacuum Coating Machine

High precision Electron Beam Evaporation Vacuum Coating Machine

Operational principle:

The working principle of GSF series high precision electron beam evaporation vacuum coating machine is that the membrane is put into the water-cooled copper crucible, heated by direct use of electron beam, the vaporized atoms or molecules of membrane material is condensed to a mould by incidence to the surface of the substrate after escaping from the surface evaporation. 

Electron beam evaporation has high thermal efficiency, beam density, evaporation speed, high puritye than normal resistance heating evaporation.


Applications:

Optical Coating machine can coat the shortwave, long wave pass, antireflection film, reflective film, filter membrane, beam splitter, band-pass film, dielectric film, highly reflective film, reflective film and various 

color film system with many layers, it can achieve the system coating film from 0-90 layer, and also can meet coating requirements for the products such as automotive reflective glass, binoculars, glasses, optical lens, cold cups and other products. 

It can be set up with different evaporation sources, electron gun and ion source and a film thickness meter to coat various membrane system, metal, oxides, compounds and other high melting membrane.


Features:

1) High-precision optical coating machine is equipped with a quartz crystal film thickness gauge, optical film thickness of the automatic control system, PLC and industrial PC systems PY3100 to realize the entire work process are under automatic control.

The coating system can be unattended, thereby the efficiency has been increased and the consistency of product quality and stability have also been improved.

2) High pumping speed vacuum system and cryogenic equipment are equiped, the excellent dynamic vacuum capability can provide necessary vacuum conditions for complex optical film system.

3) E-type electron gun with stable evaporation distribution and reliable performance is equipped for the optimal design of positional relationship between the evaporation source and work piece holder, in order to achieve precise adjustment of the membrane system of the membrane material evaporation work distribution of protection.

4) Smooth and high-speed rotation of the work piece holder rotation system is equipped to ensure the products of work piece holder inner and outer curve be more consistent.

5) It applies to optics industry, large-scale industrial production of high-end requirements. 


Model

GSF-800

GSF-1200

GSF-1400

 GSF-1600

GSFW-1000

GSFW-1200

GSFW-1600

vacuum chamber dimensions

φ800X1000

φ1200X1400

φ1400X1600

φ1600X1800

φ1000X1100

φ1200X1400

φ1600X1800

vacuum system

KT400 Diffusion pump unit

KT630 Diffusion pump unit

Dual KT630
Diffusion pump unit

KT500
Diffusion pump unit

KT630
Diffusion pump unit

Dual KT630
Diffusion pump unit

Coating system

Electron gun evaporation source, special coating auxiliary ion power or hall ion source

Inflation system

The pressure controller

Control system

Industrial computer automatic control (industrial) \ PYT2000 real-time online film monitoring system

Control mode

Manual or automatic

Filmthickness monitoring system

Quartz crystal film thickness monitoring system, optical film thickness monitoring system

Ultimate vacuum

3.0X10-4Pa

3.0X10-4Pa

3.0X10-4Pa

3.0X10-4Pa

3.0X10-4Pa

3.0X10-4Pa

3.0X10-4Pa

Remarks

Above equipment parameters for your reference only, For specific details, it will be according to customers' requirement of practical process design and choice.


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