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Electron Beam Evaporation Optical Vacuum Coating Machine

Operational principle:

Electron Beam Evaporation Optical Vacuum Coating Machine is that the membrane is put into the water-cooled copper crucible, heated by direct use of electron beam, the vaporized atoms or molecules of membrane material is condensed to a mould by incidence to the surface of the substrate after escaping from the surface evaporation.

Electron beam evaporation has high thermal efficiency, beam density, evaporation speed, high purity features than normal resistance heating.


Applications:

Optical Coating Machine can coat multiple layers short pass, long wave pass, antireflection film, reflective film, filter membrane, beam splitter, band-pass film, dielectric film, highly reflective film, reflective film of various color films , it can achieve 0-50 layers membranes coating, and also can meet such as automotive reflective glass, glasses, optical lens, cold cups and other products coating requirements. 

It can obtain various membrane system, metal, oxides, compounds and other high melting membrane system when it’s set up with different evaporation sources, electron gun and ion source and a film thickness gauge.


TIM截图20171226155728.jpg


Features:

1) Optical coating Machine is equipped with a quartz crystal thickness guague, adopts PLC and touch screen systems to achieve automatic control of the entire work process , work efficiency and product quality has been improved consistently.

2) It applies to the optics industry , large-scale industrial production requirements.


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Model

SF-800

SF-1200

SF-1400

SF-1600

SFW-1000

SFW-1200

SFW-1600

vacuum chamber dimensions

φ800 X1000MM

φ1200 X1400MM

φ1400 X1600MM

φ1600 X1800MM

φ1000 X1100MM

φ1200 X1400MM

φ1600 X1800MM

vacuum system

KT500 Diffusion pump unit

KT630 Diffusion pump unit

A pair of KT630 Diffusion pump unit

KT500 Diffusion pump unit

KT630 Diffusion pump unit

A pair of KT630 Diffusion pump unit

Coating system

Electron gun evaporation source, special coating auxiliary ion power or hall ion source

Inflation system

The pressure controller

Control mode

Manual or automatic

Film thickness monitoring system

Quartz crystal film thickness monitoring system

Pumping rate

 

5X10-3Pa<15min

Ultimate vacuum

3.0X10-4Pa

Remarks

Above equipment parameters for your reference only, For specific details, it will be according to customers' requirement of practical process design and choice.


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