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Jewelry gold PVD vacuum plating machine

Min.Order Quantity: 1 Set/Sets Jewelry gold PVD vacuum plating machine

Supply Ability: 2 Set/Sets per Month Jewelry gold PVD vacuum plating machine

Payment Terms: L/C,T/T,


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Jewelry gold PVD vacuum plating machine

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FEATURES  

 

-High realibility

 

-High productivity and flexibility

 

-Consistently brilliant end product quality

 

-Full automation capability

 

-Excellent coating flexibility

 

-Long lifetime and fast target exchange

 

-Flexible system configuration

 

-High speed coating and best PVD homogeneity

 

HCVAC decorative PVD films are routinely used as a replacement for electroplated chrome.  

They can be applied directly over almost any substrate material and can be deposited in a

wide variety of colors. The process parameters to deposit each color are stored in software

recipes with different process steps. Once the coating process has started, all of the relevant

process parameters are continuously monitored and controlled by the on-board computer software.

 

  APPLICATION  

 

It can be used to coat metal film, titanium nitride, titanium carbide, and zirconium nitride, chromium

nitride and titanium, nickel, chromium, copper , and other compounds film, multi-layer super-hard film,

nitrogen-doped titanium film and the alloy film, and in a very short time to complete all the machining

process, it is a highly efficient multi-functional coating equipment.

 

This machine is extensively used in the fields of ultra-hard coating for the tools and mould, decorative

coating for watch, jewelries, stainless steel tableware, golf head, hotel product, sanitary ware,

 luminaires, optical frame, hardware, etc .

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Mode HL-900 HL-1100 HL-1312
Dimension 900*1000mm 1100*1000mm 1350*1200mm
Coating mode and
main confirguration
Six arc targets +
one set of column targets+ one set of plane
rectangle magnetron
sputtering targets
Six arc targets + a pair of twin (MF)magnetron sputtering targets Eight arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets
Power source Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source.
Process gas control Quality flowmeter + electromagnetism ceramic valve
Vacuum chamber 
structure
Vertical single(side) door, pump system postposition, double water-cooling
Vacuum system Molecule pump +Roots pump +Mechanical pump(5.0*10-5Pa)
Diffusion pump +Roots pump +Mechanical pump(5.0*10-4Pa)
Workpiece baking temperature Normal temperature to 350 centi-degree PID control, radiation heating.
Workpiece motion mode Public rotation Frequency control: 0-20 rotation per minute
Measure mode Number display composite vacuum gauge: from atmosphere to 1.0*10-5Pa
Control mode Manual/Automatic/PC/PLC + HMI/PC four choice of control mode
Remark We can design the dimension of the equipment according to customer’s special technique requirement.

 


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